A Simple Key For Noohapou Unveiled
The POU3500 system provides dynamic temperature control of the procedure chamber cathode / electrode / anode and can be synchronized with any etch procedure.
thirty% of its peak power usage, featuring our consumers substantial reduction in working expenditures and enhanced trustworthiness.
the knowledge underneath is categorized by semiconductor system and Resource manufacturer. Each individual desk involves an purposes Matrix that reveals qulified and professional procedures.
Originally Launched in 1985, our organization has grown into a recognized leader in offering temperature Handle techniques to the global semiconductor market.
LAUDA-Noah will, to get a shopper's retrofit analysis, keep track of and change its fluid temperature Handle profiles to match an existing TCUs' so as to ensure a easy process integration by means of DAQ.
we've been guided within our perception that prosperity In this particular competitive market stems from supplying customers with remarkably engineered new products and entire world class customer service.
All static TCUs need surplus cooling & heating capacities because of their incredibly big check here course of action fluid reservoirs. the procedure fuid reservoir on LAUDA-Noah's dynamic temperature control process is lower than 1 gallon.
Together with the POU3300, it is possible to reach unprecedented results in etch efficiency, chamber uptime, diminished expense of possession and fab Area utilization – all while improving your course of action reliability.
substantial Footprint: Static units occupy sizeable space in the fabrication Instrument spot, lowering its performance.
LAUDA-Noah is Conference these new difficulties and it has incorporated energy conserving technological know-how in methods which can be friendly towards the surroundings and also have a low cost to function.
the info established Here's from a 200mm volume manufacturing wafer fab and clearly illustrates the good thing about the LAUDA-Noah POU process.
much more than ever, shrinking system geometries, demanding new processes plus a extremely aggressive setting require temperature control systems that Mix quickly and accurate temperature Handle having an emphasis on lessened operating expenditures and enhanced reliability.
the fact is usually that legitimate Dynamic Temperature Management can only be accomplished when all five (five) of the subsequent system design and style and set up prerequisites are achieved:
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